ASML CEO promises to deliver the first High-NA EUV lithography machine by the end of the year: it is about the same size as a truck and costs $300 million each

According to news from this website on September 6, ASML CEO Peter Wennink recently said in an interview with Reuters that Despite some obstacles from suppliers, the company will still follow the previously set plan to complete the production this year. High NA EUV machines will be delivered before the end of the year.

ASML indicates that the volume of a high-numerical aperture EUV lithography (High-NA EUV) equipment is equivalent to that of a truck. Each equipment The price is more than US$300 million (note on this site: currently about 2.19 billion yuan), which can meet the needs of first-line chip manufacturers and can manufacture smaller and better chips in the next ten years.

Wennink said some suppliers were unable to improve the quantity and quality of components, leading to minor delays, but overall these difficulties were manageable, with the company promising to deliver the first machine before the end of the year.

This site previously reported that for the post-3nm era, ASML and its partners are developing a new EUV lithography machine-Twinscan EXE:5000 series, which will have 0.55 NA (high NA) The lens has a resolution of 8nm, thereby avoiding double or multiple exposures as much as possible at the 3 nm and above nodes.

Related reading:

"ASML shares the latest progress of High-NA EUV lithography machine: Target to enter the factory in 2024-2025"

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