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ASML CFO Dassen responded to doubts: High-NA EUV lithography is still the most economical choice in the future, and related orders are steadily increasing
ASML CFO Dassen responded to doubts: High-NA EUV lithography is still the most economical choice in the future, and related orders are steadily increasing
According to news from this site on February 2, ASML Chief Financial Officer Roger Dassen recently accepted an interview with local Dutch media Bits&Chips. In the interview, Dassen responded to the doubts of the analyst organization SemiAnalysis, saying that High-NA (high numerical aperture) EUV (extreme ultraviolet light) lithography machines are still the most economical choice in the future.
Dassen believes that SemiAnalysis's view underestimates the complexity of the multiple exposure route. One of the key reasons for the difficulty of Intel's 10nm process is its DUV SAQP (Note from this site: Self-Aligned Quadruple Patterning , that is, self-aligned quadruple exposure) technical route is too complicated, so Intel is actively deploying High-NA EUV technology and bought the first High-NA lithography machine.
Dassen pointed out that it is natural for different customers to have different assessments of the timing of introducing High-NA. However, AMSL has received multiple new orders for High-NA EUV lithography machines every quarter.
The above is the detailed content of ASML CFO Dassen responded to doubts: High-NA EUV lithography is still the most economical choice in the future, and related orders are steadily increasing. For more information, please follow other related articles on the PHP Chinese website!
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