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It can reduce the use of expensive EUV lithography. Merck of Germany says DSA self-assembly technology will be commercially available within ten years.
It can reduce the use of expensive EUV lithography. Merck of Germany says DSA self-assembly technology will be commercially available within ten years.
According to news from this website on February 5, Anand Nambier, senior vice president of Merck of Germany, said at a press conference recently that DSA self-assembly technology will be commercialized in the next ten years, can reduce expensive EUV patterning Times , becoming an important supplement to existing photolithography technology.
Note on this site: DSA stands for Directed self-assembly. It uses the surface characteristics of block copolymers to realize the automatic construction of periodic patterns. On this basis, it is induced to finally form the desired direction-controllable pattern. pattern. It is generally believed that DSA is not suitable for use as an independent patterning technology, but rather is combined with other patterning technologies (such as traditional photolithography) to produce high-precision semiconductors.
The main application of DSA in EUV is to compensate for the random error of EUV. Random errors account for 50% of the overall patterning error in EUV processes.
Commercial large-scale application of DSA also needs to solve some problems, such as reducing defects such as bubbles, bridges and clusters that occur during pattern generation. Among them, bridge defects are one of the most common problems.
▲ The occurrence of DSA technical defects. Image source imecThe above is the detailed content of It can reduce the use of expensive EUV lithography. Merck of Germany says DSA self-assembly technology will be commercially available within ten years.. For more information, please follow other related articles on the PHP Chinese website!
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