It can reduce the use of expensive EUV lithography. Merck of Germany says DSA self-assembly technology will be commercially available within ten years.

According to news from this website on February 5, Anand Nambier, senior vice president of Merck of Germany, said at a press conference recently that DSA self-assembly technology will be commercialized in the next ten years, can reduce expensive EUV patterning Times , becoming an important supplement to existing photolithography technology.

Note on this site: DSA stands for Directed self-assembly. It uses the surface characteristics of block copolymers to realize the automatic construction of periodic patterns. On this basis, it is induced to finally form the desired direction-controllable pattern. pattern. It is generally believed that DSA is not suitable for use as an independent patterning technology, but rather is combined with other patterning technologies (such as traditional photolithography) to produce high-precision semiconductors.

▲ Anand Nambier at the press conference. Image source The Elec

Anand Nambiar said: "DSA technology is in its infancy, and we believe it will become a basic technology in EUV lithography production in the next decade. Due to the high cost of EUV technology, , customers want to reduce the number of steps using EUV. We are cooperating with major global semiconductor companies on DSA research." According to Korean media The Elec, companies that use EUV lithography such as Samsung Electronics and SK Hynix have participated in related Research

.

The main application of DSA in EUV is to compensate for the random error of EUV. Random errors account for 50% of the overall patterning error in EUV processes.

Commercial large-scale application of DSA also needs to solve some problems, such as reducing defects such as bubbles, bridges and clusters that occur during pattern generation. Among them, bridge defects are one of the most common problems.

▲ The occurrence of DSA technical defects. Image source imecAccording to data released by analyst firm TechInsights in January last year, Samsung holds 68 DSA-related patents, while TSMC and ASML hold 24 and 16 respectively.

The above is the detailed content of It can reduce the use of expensive EUV lithography. Merck of Germany says DSA self-assembly technology will be commercially available within ten years.. For more information, please follow other related articles on the PHP Chinese website!